Low Pressure Plasma Sources

These plasma sources are designed to be used equally in R&D laboratories and industry for a very large range of applications. Typical applications of such source are generation of radicals (e.g. atomic oxygen), etching, PECVD and surface treatment. We offer different plasma sources for different vacuum pressure levels.
In case of multiple plasma sources, our solid state modules can be integrated and the control can be done via CANopen® or via a control rack with touch screen.