Category: Rotary Sputter Targets

Rotary Sputtering targets are crafted through plasma spraying onto a base tube or from solid pieces, with lengths extending over 3000 mm.

Compared to planar targets, rotatable targets offer enhanced material volume and utilization, leading to extended production runs and minimized system downtime. Consequently, coating equipment throughput is heightened.

Moreover, rotatable targets facilitate the application of higher power densities, distributing heat evenly across the surface area, thus resulting in increased deposition speed and enhanced performance during reactive sputtering.

Relative density:            >99% Purity: >99.5%≥99.999%
Target size:                       φ56~190mm L: 120~5000 mm

When asking for a quotation, both “X” letters are for the diameter and length in millimeter