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The AJA International A3CV Series magnetron sputtering sources feature the unique ability to fit multiple target modules onto a common source head subassembly. This flexibility is ideal for R&D applications where the user wishes to sputter various size targets (large magnetic, small precious metal, standard size and custom size) without incurring the cost of multiple sources. A3CV sources are available in both HV and UHV mounting versions and in either axial or right angle configurations. All sources are RF and DC compatible. Gas injection chimneys, source head tilt gimbals, integral shutters and power supplies are optional.
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