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<p>Technical expertise</p>

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Article number TRGT-FeB-X-X Categories , Brand:

Iron Boride target purity: 99,5 %

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Weight 0,200000 kg
Size

HS code

8486 9000

Country

China

Material

Expected delivery time

Sputtering, is depositing thin films across diverse substrate shapes and sizes, ensuring repeatability and scalability. We customize sputter targets, providing options such as monobloc or bonded configurations. Targets are available in metallic, alloy, or ceramic materials in both planar and rotary sizes.

Evaporation materials, when heated to high temperatures, vaporize to form thin films or coatings on surfaces via evaporation. In a vacuum environment, the vaporized material directly targets the substrate surface, initiating condensation and the formation of a thin film. This process effectively coats the substrate with the evaporated material of choice.

For more target information click here

For more information about rotating sputter targets click here

For more information about target material click here

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